About: Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers

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Attributs	Valeurs
type	work Article
Is Part Of	http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/w
Subject	Article
Title	Deep-UV lithographic response and quantum efficiency calculations of poly((trimethylsilyl)methyl Methacrylate-(chloromethyl)styrene) copolymers
has manifestation of work	http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/m/web http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/m/print
related by	http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/authorship/2 http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/authorship/5 http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/authorship/3 http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/authorship/1 http://hub.abes.fr/acs/periodical/cmatex/1989/volume_1/issue_5/101021cm00005a009/authorship/4
Author	Heyward I. P. Reichmanis E. Jurek M. J. Novembre A. E. Gooden R.
is part of this journal	Chemistry of Materials

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