About: Chemical vapor deposition precursor chemistry. 2. Formation of pure aluminum, alumina, and aluminum boride thin films from boron-containing precursor compounds by chemical vapor deposition

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Attributs	Valeurs
type	work Article
Is Part Of	http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/w
Subject	Article
Title	Chemical vapor deposition precursor chemistry. 2. Formation of pure aluminum, alumina, and aluminum boride thin films from boron-containing precursor compounds by chemical vapor deposition
has manifestation of work	http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/101021cm00021a010/m/print http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/101021cm00021a010/m/web
related by	http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/101021cm00021a010/authorship/1 http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/101021cm00021a010/authorship/2 http://hub.abes.fr/acs/periodical/cmatex/1992/volume_4/issue_3/101021cm00021a010/authorship/3
Author	Spencer James T. Glass John A. Kher Shreyas S.
is part of this journal	Chemistry of Materials

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