| Abstract
| - Plasma-enhanced chemical vapor deposition of vanadium pentoxide thin films from avanadyl(IV) β-diketonate compound has been performed in a low-pressure reactor underdifferent operating conditions. The effect of various parameters, such as the flow rates ofthe carrier and reactive gas and the substrate temperatures, on films composition,microstructure, and morphology was investigated in detail. Controlled variations of thesynthesis conditions allowed a fine modulation of the sample properties, as shown by XRDand AFM analyses. In particular, at 200 °C and moderate oxygen flow, nanophasic V2O5with a strong (001) preferential orientation could be easily obtained. The composition andpurity of the films are studied by XPS and SIMS analyses, with special regard to film−substrate interdiffusion phenomena. Optical properties of the films are also investigated.
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