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À propos de : Laser-Induced Deposition of Palladium and Gas-PhasePhotofragmentation Pathways from(2-Methylallyl)(1,1,1,5,5,5-hexafluoro-2,4-pentanedionato)Palladium        

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  • Laser-Induced Deposition of Palladium and Gas-PhasePhotofragmentation Pathways from(2-Methylallyl)(1,1,1,5,5,5-hexafluoro-2,4-pentanedionato)Palladium
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  • Metallic palladium films are prepared at 10-2 Torr by 308 nm irradiation of gaseous (2-methylallyl)(1,1,1,5,5,5-hexafluoro-2,4-pentanedionato) palladium. Gas-phase luminescencespectra recorded during the photochemical deposition process are used to identify photofragments. X-ray photoelectron analysis of the films shows that they consist primarily ofpalladium metal; the films produced with H2 carrier gas have no detectable fluorine andbarely discernible carbon contaminants. The Pd films are polycrystalline fcc (face-centeredcubic) palladium with preferential growth along the 111 direction. Scanning electronmicroscopy shows that the films formed with H2 carrier gas are smooth and consist ofgranules less than 35 nm in diameter. Further characterization of the gas-phase photofragmentation process is carried out by time-of-flight mass spectroscopy. The dominant peakpresent in the mass spectrum under 308 nm irradiation arises from palladium ions. Nofragments containing palladium and other elements (especially PdC or PdF) are found.Pathways of photofragmentation, comparisons with other metal 1,1,1,5,5,5-hexafluoro-2-4-pentanedionate compounds, and the implications for laser-assisted chemical vapor depositionare discussed.
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