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| - Preparation of a Mesoporous Silica Film with a Strictly AlignedPorous Structure through a Sol−Gel Process
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| - A mesoporous silica film with a strictly aligned porous structure was prepared using an evaporation induced self-assembly process on a rubbing-treated polyimide coating. Alignment over the whole thickness with a very narrow directional distribution of ∼3° was achieved by this facile preparation.
- A novel strategy for the preparation of a mesoporous silica film, in which the in-plane alignment ofthe honeycomb packed mesochannels is strictly controlled, is developed. The highly aligned porousstructure is achieved by using a substrate with a rubbing-treated polyimide coating in the evaporationinduced self-assembly process. It is shown that the controlled porous structure is formed over the entirethickness of the film and that the alignment distribution is much narrower than that in the films preparedby the conventional process based on a heterogeneous nucleation and growth mechanism. In the presentprocess, the aligned porous structure would be formed through a directional lamellar-to-hexagonal phasetransition from the substrate surface toward the air/film interface. The new formation mechanism as wellas the lower process temperature enables the observed strict alignment control of the mesochannels.
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