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À propos de : Deposition of Copper Phthalocyanine Films byGlow-Discharge-Induced Sublimation        

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  • Deposition of Copper Phthalocyanine Films byGlow-Discharge-Induced Sublimation
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  • Copper phthalocyanine (CuPc) films are deposited by glow-discharge-induced sublimation (GDS) to study the ion bombardment effects and the condensation of CuPc molecules. The much more disordered and porous structure of these films as compared to those deposited by vacuum evaporation make them very interesting for applications in the gas-sensing field.
  • Copper phthalocyanine (CuPc) thin films have been deposited by a recently developed plasma-basedmethod named glow-discharge-induced sublimation (GDS). The deposition of CuPc films has also beenobtained by vacuum evaporation (VE) and the comparison of the two methods shows important structuraldifferences. FT-IR and ion beam analyses (RBS-ERDA) show that the GDS-deposited films mainly consistof integer CuPc molecules, but at increasing deposition time the incorporation of damaged moleculesbecomes important. X-ray diffraction, FT-IR spectroscopy, and UV−vis analysis are used to study themicrostructure of the CuPc films and point out that while the VE films consist of only α crystallites, amore disordered structure with the presence of both α and β polymorphs characterizes the GDS films.The latter films are also much more porous as shown by nitrogen physisorption measurements and SEM.Thermal treatments of the GDS films determine a decrease of the structural disorder at 250 °C and thecomplete transformation to the β polymorph at 290 °C.
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