Deposition of poly(acrylic acid) films has been carried out in air by electrohydrodynamic atomizationin post dielectric barrier discharge at atmospheric pressure. The topmost surface layer of the coatings hasbeen analyzed by X-ray photoelectron spectroscopy, revealing a high level of retention of the carboxylicacid functionality, up to 80%. These films are found to exhibit a low water contact angle and a highresistance to washing.
Deposition of poly(acrylic acid) films has been carried out in a reactor coupling a dielectric barrier discharge and an electrospraying system. This is a promising technology for polymerization of unsaturated organic precursors at atmospheric pressure.