| Abstract
| - Photoluminescent, porous silicon pixel arrays were fabricated via a Pt-promoted wet etching ofp-type Si(100) using a 1:1:1 EtOH/HF/H2O2 solution. The pixels were fabricated with micrometer-scale designrules on a silicon substrate that had been modified with an octadecyltrichlorosilane (OTS) monolayer patternedusing microcontact printing. The printed OTS layer serves as an orthogonal resist template for the depositionof a Pt(0) complex, which preferentially deposits metal species in areas not covered with OTS. The Pt centersgenerate a localized oxidative dissolution process that pits the Si in the Pt-coated regions, resulting in theformation of a porous silicon microstructure that luminesces around 580 nm upon illumination with a UVsource. Scanning electron microscopy and fluorescence microscopy images of the fabricated porous siliconstructures showed that features in the size range of ∼10−150 μm, and possibly smaller, can be generated bythis catalytically amplified soft lithographic patterning method. Importantly, the OTS acts as an etch mask, sothat, even with significant hole transport, etching is confined to areas coated with the Pt(0) complex.
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