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À propos de : Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-rayMicroprobe        

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  • Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-rayMicroprobe
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  • Soft X-ray scanning photoelectron microscopy (SPEM) was applied to image and characterize molecularpatterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembledmonolayers (SAMs). The observed chemical contrasts allowed us to monitor complex phenomena whichoccurred as a result of electron-beam patterning, the exposure of the patterned films to ambient, and theirradiation of the films by the X-ray microprobe during image acquisition. The latter effect has been analyzedin detail and utilized for direct lithographic writing in the SAM resists by the zone-plate-focused X-ray beam.The results demonstrate the capabilities of the SPEM technique both for chemical imaging and as a fabricationtool for micro- and nanolithography.
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