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http://hub.abes.fr/acs/periodical/jpcbfk/2005/volume_109/issue_21/101021jp0443411/authorship/2
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Etching Behavior of Silicon Nanowires with HF and NH4F and Surface Characterization byAttenuated Total Reflection Fourier Transform Infrared Spectroscopy: Similarities andDifferences between One-Dimensional and Two-Dimensional Silicon Surfaces
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