In this article we obtained a superhydrophobic patterned Ag film mainly by two steps. The first step is tofabricate a DNA film pattern through poly(dimethyldiallylammonium chloride) alternate deposition with DNAon a latent imaging film formed by the selective UV exposure of a photosensitive diazoresin/poly(acrylicacid) self-assembly (SA) film. The second step is to build up the patterned Ag film on a DNA film patternwith Ag electroless deposition. After surface modification with n-dodecanethiol the patterned Ag film, whichexhibits obvious microstructures and nanostructures, will possess superhydrophobic properties and the contactangle can reach ∼162°.
