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Tikhov Mintcho S.
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http://hub.abes.fr/acs/periodical/jpccck/2007/volume_111/issue_33/101021jp074766y/authorship/4
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Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer MirrorsIntended for EUV Lithography: Exploiting the Electron-Induced Chemistry
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