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Two mechanisms for formation of methyl radicals during the thermal decomposition of methyl iodide on a copper surface
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http://hub.abes.fr/acs/periodical/jpchax/1993/volume_97/issue_38/w
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Two mechanisms for formation of methyl radicals during the thermal decomposition of methyl iodide on a copper surface
has manifestation of work
http://hub.abes.fr/acs/periodical/jpchax/1993/volume_97/issue_38/101021j100140a030/m/print
http://hub.abes.fr/acs/periodical/jpchax/1993/volume_97/issue_38/101021j100140a030/m/web
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http://hub.abes.fr/acs/periodical/jpchax/1993/volume_97/issue_38/101021j100140a030/authorship/1
http://hub.abes.fr/acs/periodical/jpchax/1993/volume_97/issue_38/101021j100140a030/authorship/2
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Bent Brian E.
Lin Jong Liang
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The Journal of Physical Chemistry
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