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| - Cyclic CVD Modification of Straight Pore AluminaMembranes
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| - Alumina oxide was deposited in the straight nanosize pores of Anopore alumina membrane by thealternative introduction of trimethylaluminum (TMA) and water vapor to the membrane pores. The chemicalvapor deposition (CVD) modification was conducted under two different schemes: (1) cyclic CVD withresidual pressure and (2) cyclic CVD with purge. The membranes were characterized by single gas heliumpermeance and water vapor/oxygen multiple gas permeation. Helium gas permeation results show thatthe modification by the residual pressure scheme caused greater reduction in the pore size than porosity,suggesting the deposition of alumina in a fractal structure in the Anopore membrane pores. Such a structureis caused by combined homogeneous and heterogeneous reactions taking place respectively on the porewall and randomly in the pores. The membranes modified with CVD under the purge scheme exhibitedgreater reduction in porosity than the pore size, indicating that the alumina in the latter case was depositedon the pore wall in an atomic layer fashion. The structure in the latter case is caused by homogeneousreactions taking place on the pore wall. Membranes modified under the purge scheme exhibited improvedwater vapor/oxygen separation properties.
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