| Abstract
| - Microcontact printing (μCP) and electroless plating are combined to produce microscale patterns of silver on glasssubstrates. Silver patterns with feature sizes of 0.6−10 μm stripes are fabricated using two methods. (1) The printingseeding layer (PSL) method is to apply μCP to directly print the catalyst Sn pattern for further electroless plating.(2) The printing masking layer (PML) method is to use μCP to print the octadecyltrichlorosilane (OTS) self-assembledmonolayer as a masking layer on glass substrates, which then become Sn-activated in the unstamped regions byimmersing the substrates in stannous chloride solution. After the electroless silver plating, the PML method has a betterselectivity of silver deposition than the PSL method. In addition, variation of the deposited silver thickness as a functionof the plating time and temperature is discussed.
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