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| - Demonstration of a Directly Photopatternable Spin-On-Glass Based onHydrogen Silsesquioxane and Photobase Generators
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| - A commercially available spin-on-glass material, hydrogen silsesquioxane, has been renderedphotopatternable to micrometer dimensions by the introduction of a photobase generator at concentrationsof <5 wt %. The cure process proceeds via hydrolysis of the silyl hydride linkage by residual water inthe film, as activated by a photogenerated base catalyst. Subsequent reaction of the generated silanolwith neighboring silyl hydride groups yields a thermally stable siloxane cross-link. The photochemicalcross-linking of hydrogen silsesquioxane shows high sensitivity (<40 mJ/cm2) and is not inhibited bymolecular oxygen. The resultant oxide films can be further cured at elevated temperature either underan inert atmosphere to minimize the dielectric constant or heated in an air atmosphere to complete theconversion to silica glass. The oxidative nature of both the photo and thermal cure processes and therelease of only traces of hydrogen as byproduct results in minimal weight loss in the film during processing.
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