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| Title
| - Residual stresses in AlCrN PVD thin films
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| Abstract
| - Residual stresses may affect the mechanical stability of high quality coatings such as Al 1-xCr xN. In this study, two different physical vapour deposition techniques leading to different residuals stress states have been used for depositing Al 1-xCr xN coatings varying the chromium content. The structure and residual stress state have been investigated in Al 1-xCr xN coatings deposited on silicon substrates using X-ray diffraction, curvature measurements and nanoindentation. The obtained results are compared to literature and commented in view of the coating microstructure.
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| Date Copyrighted
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| Rights
| - © Owned by the authors, published by EDP Sciences, 2010
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| Rights Holder
| - Owned by the authors, published by EDP Sciences
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| is part of this journal
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| is primary topic
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