| Abstract
| - We have studied the effect of thermal annealing on electron dephasing times $\tau_\phi$ in three-dimensional polycrystalline metals. Measurements are performed on as-sputtered and annealed AuPd and Sb thick films, using the weak-localization method. In all samples, we find that $\tau_\phi$ possesses an extremely weak temperature dependence as $T\,\rightarrow\,0$. Our results show that the effect of annealing is non-universal, and it depends strongly on the amount of disorder quenched in the microstructures during deposition. The observed “saturation" behavior of $\tau_\phi$ cannot be easily explained by magnetic scattering. We suggest that the issue of saturation can be better addressed in three-dimensional, rather than lower-dimensional, structures.
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