| Abstract
| - A simple one-pot method has been developed to deposit discreet nanometer line formations on silicon substrateswithout any surface pretreatment starting with vanadium pentoxide sol−gels. These vanadium suspensionswere made by hydrolyzing amorphous V2O5 in water. The properties of the vanadium clusters were determinedthrough X-ray diffraction, elemental analyses, pH calculations, and concentration calculations. Morphologyof the lines was examined with optical microscopy, atomic force microcoscopy, and scanning electronmicroscopy. Infrared spectroscopy was used to inspect the organic components. The vanadium sol−gel usedformed discreet and regular lines with high reproducibility and on the same order of magnitude as otherpatterning techniques. Previous research with a low solubility, 8 g/L, metal oxide for line, ring, or helixformation has not been found in the literature; this work could lead to novel applications of metal oxidessuch as porous catalysts, battery materials, and resistive electronic materials.
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