| Abstract
| - The study utilizes surface sensitive techniques in order to quantitatively characterize the nature of organizationand bonding of alkanethiol adsorbates on GaP (100) surfaces. The evaluation was performed using watercontact angle, atomic force microscopy (AFM), Fourier transform infrared (FT-IR) spectroscopy, and X-rayphotoelectron spectroscopy (XPS). The hydrophobicity and consistency of surface roughness were studiedvia water contact angle and AFM. The FT-IR experimental protocol permitted the identification of characteristicfunctional groups on the surface and enabled insight into the organization within the adlayers on the GaPsurface. XPS data showed evidence for the formation of a covalent bond between the sulfur and the surfaceand was used to calculate the adlayer thicknesses, tilt angles, and molecular coverages for different adsorbates.The thickness and tilt angles values were comparable to other modified semiconductor materials. High coverageswere observed for all alkanethiols on GaP (100). The quantitative XPS protocol reported can be applied tothe evaluation of other adsorbates on semiconductor materials.
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