| Abstract
| - High-density Pd line arrays with 55 nm line-width were obtained using nanocontact-printed dendrimer monolayers.Elastomeric PDMS stamps for nanocontact printing were replicated from silicon master molds which were fabricatedby UV nanoimprinting in combination with reactive ion etching. The fabrication method effectively controlled theaspect ratios of high-density lines for resolving the problems encountered in both replicating silicon masters to PDMSstamps and printing with the replicated PDMS stamps. Using the PDMS nanostamp with an optimized aspect ratio,a self-assembled monolayer of dendrimer was patterned on a Pd film via nanocontact printing, which was facilitatedby the strong interaction between Pd and amine groups of the dendrimer. The patterned self-assembled monolayerwas used as an etch-resist mask against the wet etchant of Pd, leaving behind a high-density Pd line array over largeareas. The resulting functional Pd nanopattern is of practical significance in microelectronics and bio- or gas-sensingdevices.
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