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http://hub.abes.fr/acs/periodical/cmatex/2003/volume_15/issue_22/101021cm034649p/authorship/3
http://hub.abes.fr/acs/periodical/cmatex/2006/volume_18/issue_26/101021cm060731j/authorship/1
http://hub.abes.fr/acs/periodical/langd5/2006/volume_22/issue_7/101021la0525170/authorship/1
http://hub.abes.fr/acs/periodical/langd5/2007/volume_23/issue_25/101021la701906n/authorship/6
http://hub.abes.fr/acs/periodical/jacsat/2004/volume_126/issue_22/101021ja0319083/authorship/3
http://hub.abes.fr/acs/periodical/cmatex/2004/volume_16/issue_18/101021cm034892o/authorship/2
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Two-Dimensional Polymer Nanopattern byUsing Particle-Assisted Soft Lithography
Arrays of Binary and Ternary Particlesand Their Replica Pores on PatternedMicrochannels
Nanoscopic Pd Line Arrays Using Nanocontact Printed Dendrimers
Creating Surfactant Nanoparticles for Block Copolymer Compositesthrough Surface Chemistry
Controlled Fabrication of Hollow Metal PillarArrays Using Colloidal Masks
Colloidal Lithographic Nanopatterning via Reactive IonEtching
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